Demand for xenon for use with semiconductor disappeared. Xenon was employed at Higashi (East) Hiroshima plant of Elpida Memory in 2004. The use of the gas for use with semiconductor began at a new production line in Yokkaichi plant of Toshiba in 2008. The demand in 2008 came to 1 million liter. However, due to the slump in semiconductor sector after that, use of xenon has rapidly decreased and been almost dying. The gas had been using for damage-free etching for gate oxide, but it has replaced by argon because there is a limit in capacity for xenon to supply and its cost is high. The xenon for use with semiconductor has disappeared after just 5 years since its first use.